ASML and TSMC want bigger masks for smaller chips

ASML and chipmaking giant TSMC have launched an industry-wide push toward 12-inch photomasks, saying the larger format could lower costs and overcome some limitations of high-NA EUV lithography. Dutch firm ASML, the only commercial supplier of EUV lithography systems, says it and TSMC have established a collaboration intended to lead the transition to larger-format photomasks for extreme ultraviolet (EUV) lithography. Intel Foundry and Samsung Electronics have also voiced their support.