Intel Begins Using ASML’s High-NA EUV Tool for Panther Lake Chips

The chipmaker is deploying the advanced lithography system for select production layers to refine manufacturing of its next-generation laptop processors. Intel has started using ASML’s next-generation high numerical aperture (High-NA) extreme ultraviolet (EUV) lithography system to manufacture select layers of its flagship Panther Lake laptop processors, marking a significant step in the adoption of advanced […]