A Massively Parallel GPU Rasterizer for Next-generation Computational Lithography

Computational lithography, critical for advanced semiconductor manufacturing, demands high-performance rasterization to meet nanometer-scale precision. Traditional CPU-based rasterizers struggle with the increasing complexity and data volumes of modern designs. This paper presents a massively parallel GPU rasterizer designed to accelerate high-resolution mask synthesis, lithography simulation, and optical proximity correction (OPC). Our innovative GPU-accelerated approach leverages a GPU-friendl