Beyond The EPE Budget: Building The Next Generation Of Computational Lithography

At the recent SPIE Photomask Technology + Extreme Ultraviolet Lithography conference, an expert panel discussed the growing importance of edge placement error (EPE). I had the pleasure of joining moderator Jed Rankin of IBM and fellow panelists Hans Stiepan of Carl Zeiss SMT, Ezequiel Vidal-Russell of Micron Technology, Jo Finders of ASML, Il-Yong Jang of Tekscend, and Vivek Balasubramanian of Applied Materials. Together, we brought perspectives spanning OPC and EDA, mask technology, lithography