1.4nm single-patterned processes need High NA, says imec

To avoid the need for multi-patterning in  1.4nm and 1nm processes, High-NA EUV will be needed, says imec. ‘For A14 and A10 logic nodes, requirements for the most critical metal ... The post 1.4nm single-patterned processes need High NA, says imec appeared first on Electronics Weekly .