Intel Foundry and ASML collaborate to accelerate industry readiness for high-NA EUV

At the SPIE Photomask Technology + Extreme Ultraviolet Lithography conference, Intel Foundry and ASML highlighted continued progress in bringing high numerical aperture (High NA) extreme ultraviolet (EUV) lithography into production and advancing the technologies that will shape its future adoption. Specifically, Intel Foundry and ASML shared the following updates: * High NA continues to be used in high-volume manufacturing production at Intel Foundry today, with more than one million wafers pro