Samsung And ASML Expand High-NA EUV Partnership

Samsung plans to bring ASML’s High-NA EUV technology to DRAM mass production by 2028, while larger photomasks could help improve fab productivity and reduce chipmaking costs. Samsung Electronics and semiconductor equipment maker ASML are expanding their strategic partnership on High-NA extreme ultraviolet (EUV) lithography, with Samsung planning to introduce the technology into DRAM mass production […]