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pulse Semiconductor Engineering September 11, 2026

Molybdenum Quasi Phase-Only Masks Improve EUV Imaging (NYCU, TSMC)

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Researchers at National Yang Ming Chiao Tung University and TSMC published a technical paper titled “High contrast EUV imaging enabled by topological quasi phase-only masks.” Abstract Excerpt: “Here, we propose a paradigm shift in EUV PSM technology by introducing molybdenum (Mo)-based quasi phase-only masks (quasi-POMs) with high reflectivity and minimal absorption. Through rigorous electromagnetic simulations, we demonstrate that Mo quasi-POMs deliver up to 35% higher image contrast, a fivefol

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